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Electrochemical, Spectrochemical and Quantum Chemical Studies on Dimedone as Corrosion Inhibitor for Copper in Acetonitrile | Chapter 09 | Advances in Applied Science and Technology Vol. 3

A number of techniques have been applied in the investigation of inhibition abilities of dimedone (DMD) for copper in acetonitrile at 25°C. By potentiodynamic polarization and electrochemical impedance spectroscopy (EIS), the corrosion resistance was found to be increased with inhibitor concentration up to 93.68% inhibition efficiency at 3.00 mM, indicating that DMD molecules can cumulatively adsorb on the copper surface and finally form a protective film on copper-solution interface. This is also supported by the decreasing of copper oxidation in cyclic voltammogram. Polarization curves revealed that DMD is of mixed type inhibitor.

The adsorption of DMD on copper surface obeys the Langmuir isotherm and the adsorption mechanism is of physisorption type. The values of standard energy of adsorption (∆Goads) were found to be in good agreement for both polarization and impedance techniques to be -8.17 and -8.43 kJmol-1 respectively. Fourier Transform Infrared spectroscopy (FT-IR) confirmed the interaction of copper with oxygen on DMD. The mole ratio method suggested that the complexation ratio of copper-DMD is 1:2. Scanning electron microscopy (SEM) of copper surface after immersion in DMD solution indicates the presence of a protective layer on the electrode surface. The frontier molecular orbital energy EHOMO (highest occupied molecular orbital), ELUMO (lowest unoccupied molecular orbital) and the Mulliken charge distribution obtained from Quantum chemical calculations revealed (∆E) for DMD 0.2091 hartree, reflecting strong adsorption of the molecules on copper surface. The enhanced corrosion inhibition is possibly due to the compact film structure blocking electron transfer at the electrode surface. This provides a typical example in understanding the system as well as interpretation of the data by both traditional and advanced technology to support the newly coming technology which would make science much more fruitful.

Author(s) Details

Pipat Chooto
Analytical Chemistry Division, Department of Chemistry, Faculty of Science, Prince of Songkla University, Hatyai, Songkhla 90112, Thailand.

Sontaya Manaboot
Analytical Chemistry Division, Department of Chemistry, Faculty of Science, Prince of Songkla University, Hatyai, Songkhla 90112, Thailand.

View Volume: https://doi.org/10.9734/bpi/aast/v3

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